发明名称 Lithographic apparatus and device manufacturing method
摘要 To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal containing the liquid.
申请公布号 US2006082741(A1) 申请公布日期 2006.04.20
申请号 US20040966111 申请日期 2004.10.18
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER TOORN JAN-GERARD C.;HOOGENDAM CHRISTIAAN A.
分类号 G03B27/52 主分类号 G03B27/52
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