发明名称 |
Compensation of reflective mask effects in lithography systems |
摘要 |
Aberrations may be introduced in mirror surfaces used in a lithography system utilizing a reflective mask to compensate for adverse optical effects associated with reflective masks. A spherical aberration may be introduced to compensate for a shift in the location of best focus. A coma aberration may be introduced to compensate for a pattern shift.
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申请公布号 |
US2006082750(A1) |
申请公布日期 |
2006.04.20 |
申请号 |
US20050293593 |
申请日期 |
2005.12.02 |
申请人 |
CHANDHOK MANISH;GOLDSTEIN MICHAEL |
发明人 |
CHANDHOK MANISH;GOLDSTEIN MICHAEL |
分类号 |
G03B27/52;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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