RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern to decrease LWR (line width roughness).

SOLUTION: The positive resist composition contains a resin component (A) and an acid generator component (B), wherein the component (A) contains a polymer compound (A1) having (a0) a structural unit expressed by a general formula (a0) and (a1) a structural unit derived from (α-lower alkyl) acrylate having an acid dissociative dissolution inhibiting group and not corresponding to the structural unit (a0). In general formula (a0), R represents a hydrogen atom or a lower alkyl group; Y1represents an aliphatic cyclic group; Z represents an alkoxy alkyl group; (a) represents an integer 1 to 3; and b represents 0 or an integer 1 or 2 satisfying a+b=1 to 3.

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