发明名称 MONITORING METHOD AND MONITORING SYSTEM
摘要 PROBLEM TO BE SOLVED: To easily grasp a state of a device placed in a vacuum by using a length-measuring SEM which is a device conveying a wafer into a sample chamber kept in a high-vacuum state to make length measurement of a line width and a hole diameter of a semiconductor device. SOLUTION: The state of the device placed in vacuum is grasped by forming a screen showing a state of a drive system in vacuum, a vacuum state of a vacuum bulb, and a sate of an electronic optical system. ON/OFF timing, Open/Close timing and vacuum states of a variety of sensors, are formed in a timing chart, so that the device makes time measurement and comparison with reference data. With this function provided, accurate judgment is made at device maintenance/inspection and in device repair. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006108086(A) 申请公布日期 2006.04.20
申请号 JP20050273103 申请日期 2005.09.21
申请人 HITACHI LTD 发明人 FUKUBE HITOSHI;SONOBE KENICHIRO;ARIMA JUNTARO
分类号 H01J37/24;G01B15/00;G01N23/225;G01N27/62;H01J49/00;H01L21/027 主分类号 H01J37/24
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