SYSTEM AND METHOD FOR CORROSIVE VAPOR REDUCTION BY ULTRAVIOLET LIGHT

摘要

A system and method for reducing out-gassing, i.e. discharge or emissions, of corrosive vapors/gasses, such as Hydrogen Bromide, Hydrogen Chloride and/or Hydrogen Fluoride, from semiconductor processing equipment and processed semi-conductor materials, into the surrounding environment is disclosed. Out-gassing is the release of gases from the surfaces of a solid body. In the disclosed system and method, after the requisite semiconductor processing has completed, a radiant energy source, such as an ultraviolet light source is exposed to the corrosive gas or processed semiconductor materials, e.g. wafers, while the gas or materials are still contained within the processing equipment. The ultraviolet light energy decomposes the corrosive gas into lesser corrosive components thereof, i.e. disassociates the molecules of the corrosive gas. The disassociated species may then combine into volatile molecules that may be evacuated through the pumping system to an exhaust system. The processing equipment can then be opened releasing fewer corrosive components into the surrounding environment.