发明名称 Method of fabricating a display device, and apparatus for forming a thin film
摘要 A plurality of processing chambers are connected to a common chamber (103 in Fig. 1), and they comprehend a processing chamber for oxidation (107), a processing chamber for solution application (108), a processing chamber for baking (109), and processing chambers for vapor-phase film formation (110, 111). Owing to a thin-film forming apparatus of such construction, it is permitted to fabricate an EL (electroluminescence) element employing a high-molecular EL material, without touching the open air. Thus, an EL display device of high reliability can be fabricated.
申请公布号 EP1071117(A3) 申请公布日期 2006.04.19
申请号 EP20000115329 申请日期 2000.07.14
申请人 SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI, SHUNPEI
分类号 H01L21/00;H01L31/12;C23C14/04;C23C14/56;H01L51/40;H01L51/56 主分类号 H01L21/00
代理机构 代理人
主权项
地址