发明名称 |
OPTICAL METROLOGY OF STRUCTURES FORMED ON SEMICONDUCTOR WAFERS USING MACHINE LEARNING SYSTEMS |
摘要 |
A structure formed on a semiconductor wafer is examined by obtaining a first diffraction signal measured using a metrology device. A second diffraction signal is generated using a machine learning system, where the machine learning system receives as an input one or more parameters that characterize a profile of the structure to generate the second diffraction signal. The first and second diffraction signals are compared. When the first and second diffraction signals match within a matching criterion, a feature of the structure is determined based on the one or more parameters or the profile used by the machine learning system to generate the second diffraction signal.
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申请公布号 |
KR20060033740(A) |
申请公布日期 |
2006.04.19 |
申请号 |
KR20057024949 |
申请日期 |
2004.06.25 |
申请人 |
TIMBRE TECHNOLOGIES, INCORPORATED |
发明人 |
DODDI SRINIVAS;DREGE EMMANUEL;JAKATDAR NICKHIL;BAO JUNWEI |
分类号 |
G06F15/18;G01B11/24;G01Q30/02;G01Q90/00;G06F;G06F19/00;G06N3/08;H01L21/66 |
主分类号 |
G06F15/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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