发明名称 Extreme ultraviolet reticle protection using gas flow thermophoresis
摘要 Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle and a reticle shield to reduce particle contamination on the reticle are disclosed. According to one aspect of the present invention, an apparatus that reduces particle contamination on a surface of an object includes a plate and a gas supply. The plate is positioned in proximity to the object such that the plate, which has a second temperature, and the object, which has a first temperature, are substantially separated by a space. The gas supply supplies a gas flow into the space. The gas has a third temperature that is lower than both the first temperature and the second temperature. The gas cooperates with the plate and the object to create a temperature gradient and, hence, a thermophoretic force that conveys particles in the space away from the object.
申请公布号 US7030959(B2) 申请公布日期 2006.04.18
申请号 US20040898475 申请日期 2004.07.23
申请人 NIKON CORPORATION 发明人 SOGARD MICHAEL
分类号 G03B27/52;F26B5/04;G03B27/42;G03B27/62;H01L21/302 主分类号 G03B27/52
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