发明名称 Double density MRAM with planar processing
摘要 The semiconductor industry seeks to replace traditional volatile memory devices with improved non-volatile memory devices. The increased demand for a significantly advanced, efficient, and non-volatile data retention technique has driven the development of integrated magnetic memory structures. In one aspect, the present teachings relate to magnetic memory structure fabrication techniques in a high density configuration that includes an efficient means for programming high density magnetic memory structures.
申请公布号 US7029926(B2) 申请公布日期 2006.04.18
申请号 US20040991876 申请日期 2004.11.18
申请人 MICRON TECHNOLOGY, INC. 发明人 HURST ALLAN T.;SATHER JEFFREY;GADBOIS JASON B.
分类号 H01L21/00;G11C11/15;H01L27/22 主分类号 H01L21/00
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