发明名称 Compound semiconductor device, production method thereof, light-emitting device and transistor
摘要 A semiconductor device having a silicon single crystal substrate and a boron phosphide semiconductor layer containing boron and phosphorus as constituent elements on a surface of the silicon single crystal substrate is disclosed. The surface of the silicon single crystal substrate is a {111} crystal plane inclined at an angle of 5.0° to 9.0° toward a <110> crystal azimuth.
申请公布号 US7030003(B2) 申请公布日期 2006.04.18
申请号 US20040793832 申请日期 2004.03.08
申请人 SHOWA DENKO KABUSHIKI KAISHA 发明人 UDAGAWA TAKASHI
分类号 H01L21/28;H01L21/20;H01L29/04;H01L29/20;H01L29/737;H01L29/812;H01L29/861;H01L33/00;H01L33/16;H01L33/30 主分类号 H01L21/28
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