发明名称 |
Method for optimized laser annealing smoothing |
摘要 |
A laser annealing mask is provided with cross-hatched sub-resolution aperture patterns. The mask comprises a first section with aperture patterns for transmitting approximately 100% of incident light, and at least one section with cross-hatched sub-resolution aperture patterns for diffracting incident light. In one aspect, a second mask section with cross-hatched sub-resolution aperture patterns has an area adjacent a vertical edge and a third mask section with cross-hatched sub-resolution aperture patterns adjacent the opposite vertical edge, with the first mask section being located between the second and third mask sections. The section with cross-hatched sub-resolution aperture patterns transmits approximately 40% to 70%, and preferably 50% to 60% of incident light energy density. In some aspects, the section with cross-hatched sub-resolution aperture patterns includes a plurality of different cross-hatched aperture patterns. The cross-hatched sub-resolution aperture patterns can be defined by horizontal gap and slits, as well as vertical gap and slits.
|
申请公布号 |
US7029961(B2) |
申请公布日期 |
2006.04.18 |
申请号 |
US20040913678 |
申请日期 |
2004.08.05 |
申请人 |
SHARP LABORATORIES OF AMERICA, INC. |
发明人 |
CROWDER MARK ALBERT;MITANI YASUHIRO;VOUTSAS APOSTOLOS T. |
分类号 |
H01L21/3205;B23K26/06;H01L21/00;H01L21/20;H01L21/302;H01L21/44;H01L21/461;H01L21/84 |
主分类号 |
H01L21/3205 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|