SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which causes little variation in semiconductor devices and can reduce a cost with few material and has a high yield, by providing a method of forming a semiconductor region having a fine shape. SOLUTION: Laser light is irradiated on part of a semiconductor film to form an insulation film, and then the semiconductor film is etched with the insulation film as a mask to form a semiconductor region having a desired shape. Using the semiconductor region, a semiconductor device is manufactured. This method allows the formation of the semiconductor region having a fine shape at a desired position without using a photolithographic process which uses a well-known resist. COPYRIGHT: (C)2006,JPO&NCIPI