| 摘要 |
A magnetron sputter coating apparatus is provided for coating the interior surface of a hollowed workpiece with sputter material from a sputter target material having a longitudinal bore. The apparatus includes a magnet assembly positionable substantially within a sputter target material disposed within workpiece and radially inward of the interior surface of the workpiece. The apparatus also includes a support structure supporting a plurality of magnets such that the magnets are circumferentially spaced apart about the support structure and such that a circumferentially directed magnetic field is generated about the sputter target material.
|
