| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment for reducing replacement time required for arranging another substrate on a substrate support. <P>SOLUTION: The lithography equipment comprises a replaceable object handling device, capable of replacing a replaceable object using replaceable object station and support. The replaceable object is one substrate W. Pattern forming device and support are one of a substrate support WT and the pattern forming device support. The replaceable object handling device 1 comprises an intermediate holding device 3 for holding the replaceable object. The intermediate holding device 3 can act mutually with the support WT such that the substrate W is arranged on the support WT or the substrate W is taken out from the support WT. A robot 2 can replace the replaceable object, using the support WT, the intermediate holding device 3 and the replaceable object station. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
