| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To obtain a selective cleaning composition for removing residues such as photoresist, etching residue, etc., and to provide a cleaning method. <P>SOLUTION: The method for removing residues such as photoresist and/or etching residue, etc., from an article by the composition comprising a specified organic solvent containing at least 50 wt.% of a glycol ether and at least 0.5 wt.% of a quaternary ammonium compound comprises bringing the composition into contact with a substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
