| 摘要 |
PROBLEM TO BE SOLVED: To obtain a manufacturing method of a photomask capable of regulating an element shape with high accuracy in thin-film magnetic heads for upper face and for lower face of a magnetic recording medium of which the element shape has a mirroring relation, and a manufacturing method of the thin-film magnetic heads. SOLUTION: When magnetic pole parts of the thin-film magnetic heads for upper face and for lower face are formed, a photoresist is uniformly applied on a lower core layer at first. Next, a shared mask pattern provided with recessed/projected parts for upper face and for lower face for regulating the magnetic pole shape, symmetrically with respect to a center line parallel to the direction of track width, is exposed to the photoresist. Subsequently, any one area of recessed/projected part sides for upper face and for lower face from the center line of the shared mask pattern is light-shielded and another area is exposed again and developed, and a resist pattern for upper face having the recessed/projected part for upper face and a resist pattern for lower face having the recessed/projected part for lower face are respectively formed. Then, the magnetic pole parts are formed by using the resist patterns for upper face and for lower face. COPYRIGHT: (C)2006,JPO&NCIPI
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