发明名称 MEASURING METHOD AND MEASURING INSTRUMENT
摘要 PROBLEM TO BE SOLVED: To compensate noises occurring in supplying a new specimen to an instrument as to a measuring method and the measuring instrument for performing specimen analysis by generating an evanescent wave by causing a light beam to be totally reflected by a boundary face between a thin film layer adjoining a measuring object such as the specimen and a dielectric block, and thereby measuring a change arising in the intensity of the totally reflected light beam to perform specimen analysis. SOLUTION: Preliminary measurement is performed on noise signals occurring in supplying a new buffer (specimen) to a measurement part 63. The result thereof is stored in an unillustrated storage means in a signal processing part 20. Compensation is performed in such a way that noise signals occurring in supplying a new specimen at the time of regular measurement are removed on the basis of noise signals obtained in the preliminary measurement. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006098207(A) 申请公布日期 2006.04.13
申请号 JP20040284511 申请日期 2004.09.29
申请人 FUJI PHOTO FILM CO LTD 发明人 SHIMIZU HITOSHI
分类号 G01N21/27 主分类号 G01N21/27
代理机构 代理人
主权项
地址