发明名称 Method for magnetron sputter deposition
摘要 A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an interior surface substantially defining a bore having a longitudinal axis; positioning a magnetron within thed bore along substantially the length of said longitudinal axis and substantially radially equidistant from the interior surface, said magnetron comprising an external sputter target material; and, generating a circumferential magnetic field about the sputter target material for a time and under sputter deposition conditions effective to produce an interior surface comprising a substantially uniform coating comprising said sputter target material.
申请公布号 US2006076231(A1) 申请公布日期 2006.04.13
申请号 US20040962772 申请日期 2004.10.12
申请人 SOUTHWEST RESEARCH INSTITUTE 发明人 WEI RONGHUA
分类号 C23C14/00;C23C14/32 主分类号 C23C14/00
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