摘要 |
<p>Apparatus for regenerating soiled cleaning fluid from the cleaning of sawn wafer blocks comprises a centrifuge (104) for removing solids from the soiled fluid; a supply system (102, 110, 112) for transferring the soiled fluid from the block cleaning device (100) to the centrifuge; and a recycling system (106, 114, 116) for returning the purified fluid to the block cleaning device.</p> |