| 摘要 |
PROBLEM TO BE SOLVED: To provide the manufacturing method of a phase shifter which manufactures a desired phase modulation pattern with high precision, and also to provide a laser annealing device. SOLUTION: In the manufacturing method of a phase shifter that comprises a pattern for phase-modulating incident light on a quartz substrate, a metal film is deposited on the quartz substrate, on which a resist film is applied for exposure and development, to form a resist pattern. The manufacturing method includes a process in which the metal film is etched by a first reactive etching with the resist pattern as a mask to form a metal film pattern, a process where a transparent substrate is etched by a second reactive etching with the resist pattern and the metal film pattern as masks to form a pattern on the transparent substrate, and a process for removing the metal film pattern. The phase shifter allows pattern formation of almost vertical shape with no taper. A uniform shape is attained in a plane as well. COPYRIGHT: (C)2006,JPO&NCIPI
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