| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity exposure apparatus suitable for transferring a mask pattern according to proximity exposure on the substrate of large-size flat panel display etc. such as liquid crystal display and plasma display capable of quickly performing stable gap control. <P>SOLUTION: A control means stores a measurement result of the position of the under surface of the mask M by a gap sensor 31 when a substrate stage 2 is separated from the mask M by a predetermined distance and sets the result to a reference value. When the measurement result of the position of the under surface of the mask M by the gap sensor 31 comes to the reference value after the substrate stage 2 is close to the mask M, a vertical fine adjusting device 8 which vertically finely moves the substrate stage 2 is controlled so that the gap between the mask M and the substrate W determined based on the result measured by the gap sensor 31 becomes the target value. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
