| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provided a porous organic silicate glass film, and to provide a method of manufacturing the same. <P>SOLUTION: The film represented by Formula Si<SB>v</SB>O<SB>w</SB>C<SB>x</SB>H<SB>y</SB>F<SB>z</SB>(in the Formula, v+w+x+y+z=100%, v is 10 to 35 atom %, w is 10 to 65 atom %, x is 5 to 30 atom %, y is 10 to 50 atom %, and z is 0 to 15 atom %) has a network structure of silicate having Si-CH<SB>3</SB>, pores, and a dielectric constant that is smaller than 2.7. A preliminary film is deposited by organosilane and/or organosiloxane precursor and a pore formation precursor using a CVD method. A pologene precursor allows pores to be formed in the preliminary film. Then, it is removed and a porous film is given to it. The composition comprises an organosilane and/or organosiloxane compound, containing at least one Si-H bond and the pologene precursor of hydrocarbon containing alcohol, ether, carbonyl, carboxylic acid, ester, nitroglycerine, and first, second, and/or tertiary amine functionality, or the combination thereof. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
