| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for an electrooptical device which is suitably made thin by etching. SOLUTION: The manufacturing method includes the stages of: applying a plurality of sealants 11 for the electrooptical device onto a 1st mother substrate 104 and a sealant 21 for molding made of material having higher etching resistance than the sealants for the electrooptical device to enclose the plurality of sealants 11 for the electrooptical device; sticking the 1st mother substrate 104 and a 2nd mother substrate 103 arranged opposite the 1st mother substrate 104 across the sealants 11 for the electrooptical device and the sealant 21 for molding; curing the sealants 11 for the electrooptical device and the sealant 12 for molding on the 1st mother substrate 104 and 2nd mother substrate 103 which are stuck together; and etching the 1st mother substrate 104 and 2nd mother substrate 103 which are stuck with the cured sealants 11 for electrooptical device and sealant 21 for molding. COPYRIGHT: (C)2006,JPO&NCIPI
|
