发明名称 Charged particle beam apparatus
摘要 A charged particle beam apparatus in which an electrostatic lens is used as a main focusing element to obtain a subminiature high-sensitivity high-resolution SEM, a drift tube for an electron beam is located inside a column between an electron source and a sample, and a detector for secondary electrons is located inside the drift tube. This solves the problem associated with the provision of a secondary electron detector, which heretofore has been a bottleneck in making a subminiature high-resolution SEM column.
申请公布号 US2006076489(A1) 申请公布日期 2006.04.13
申请号 US20050196399 申请日期 2005.08.04
申请人 OHSHIMA TAKASHI;SATO MITSUGU;KATAGIRI SOICHI 发明人 OHSHIMA TAKASHI;SATO MITSUGU;KATAGIRI SOICHI
分类号 G21K7/00 主分类号 G21K7/00
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