| 发明名称 |
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
<p>A positive resist composition comprising a resin ingredient (A) and an acid generator ingredient (B), wherein the ingredient (A) comprises a polymer (A1) having (a0) a structural unit represented by the following general formula (a0) and (a1) a structural unit which is derived from an (a-lower alkyl)acrylic ester having an acid-dissociable dissolution-inhibitive group and is not a structural unit (a0). (a0) (R represents hydrogen or lower alkyl; Y<sup</p> |
| 申请公布号 |
WO2006038635(A1) |
申请公布日期 |
2006.04.13 |
| 申请号 |
WO2005JP18382 |
申请日期 |
2005.10.04 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD.;HAYASHI, RYOTARO |
发明人 |
HAYASHI, RYOTARO |
| 分类号 |
G03F7/039;C08F20/18;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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