| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus which can secure the uniformity of in-plane temperature distribution of a heat-treated substrate. SOLUTION: The heat treatment apparatus comprises a heat treatment plate 11, top cover 50, side cover 60, outward heat transport passage 71, and homeward heat transport passage 72. The outward heat transport passage 71 circulates the steam of an operating liquid 16 from the hollow part 10 of the heat treatment plate 11 toward the hollow part 51 of the top cover 50, with its one end connected to an exhaust port 11a and the other end connected to an inflow port 50a. The homeward heat transport passage 72 circulates the steam of the operating liquid 16 from the hollow part 51 of the top cover 50 toward the hollow part 10 of the heat treatment plate 11, with its one end connected to an exhaust port 50b and the other end connected to an inflow port 11b. COPYRIGHT: (C)2006,JPO&NCIPI
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