发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device provided with an organic TFT having high reliability while manufactured through a simplified production process, in view of the problem that an organic semiconductor layer of an organic TFT tends to deteriorate under influence of water, light, oxygen, or the like. SOLUTION: A semiconductor layer containing an organic material is formed through etching with use of a mask and the organic TFT is completed with the mask left unremoved on the semiconductor layer. Employing the remaining mask allows protecting the semiconductor layer from the deterioration caused by water, light, oxygen, or the like. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100808(A) 申请公布日期 2006.04.13
申请号 JP20050246919 申请日期 2005.08.29
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 MAEKAWA SHINJI
分类号 H01L21/336;H01L29/786;H01L51/05 主分类号 H01L21/336
代理机构 代理人
主权项
地址