发明名称 SOLID-STATE IMAGING APPARATUS AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid-state imaging device that prevents image defects such as flares or ghosts by reflection at a microlens surface and is useful to improve sensitivity. SOLUTION: The surface of a microlens 7 formed by heating and melting (reflow) process or by the use of a gray tone mask is processed by plasma and wet etching and is made uneven (roughened). This suppresses the reflection at the surface of the microlens and prevents reflection with a camera lens, and then the occurrence of the image defects such as flares or ghosts can be suppressed and also, is useful to improve the sensitivity. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100764(A) 申请公布日期 2006.04.13
申请号 JP20050019205 申请日期 2005.01.27
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 KOBAYASHI MASATO;HONJO MAMORU
分类号 H01L27/14;H04N5/335;H04N5/359;H04N5/369;H04N5/372;H04N5/374;H04N101/00 主分类号 H01L27/14
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