发明名称 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To enable the efficient removal of minute particles without causing damage to a substrate. SOLUTION: Pure water containing a dissolved nitrogen gas is supplied from the lower part of a processing tank 562 and overflowed from the upper end of the processing tank 562. The inside of a casing 560 including the processing tank 562 is decompressed while the overflow state is continued. The nitrogen gas dissolved in the pure water saturates and becomes minute bubbles B1 in the pure water. The bubbles B1 grow between the substrate W and particles PT to separate the particles PT from the substrate W. The particles separated from the substrate W are transferred upward and rapidly removed by the flow of the pure water. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100314(A) 申请公布日期 2006.04.13
申请号 JP20040280970 申请日期 2004.09.28
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 IZUMI AKIRA
分类号 H01L21/304 主分类号 H01L21/304
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