| 摘要 |
<P>PROBLEM TO BE SOLVED: To form an accurate pattern, to improve the recording density of a magnetic recording medium, and to increase signal intensity. <P>SOLUTION: In an electron beam drawing method, a pattern is drawn by irradiating resist with electron beams by using an electron beam drawing apparatus provided with a moving mechanism for moving a stage on which a substrate coated with resist is mounted in one horizontal direction and a rotary mechanism for rotating the stage. In the case of exposing the resist by gradually changing the deflection quantity of electron beams so as to draw a concentric circle on the resist in each rotation, a place exposed once is exposed by changing the deflection quantity of electron beams at least once after the succeeding rotation and after. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
