| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proximity aligner which provides exposure without having a mask misalignment on mind. <P>SOLUTION: In a step type proximity aligner, a substrate stage 2 is relatively step-moved to a mask M, and the mask M is made close to a substrate W for each step. In a state of an opposing layout, pattern exposing lights are irradiated, whereby a plurality of patterns drawn on the mask M are transferred onto the substrate W by exposure. The aligner comprises a displacement sensor 30 which is provided in a mask retaining frame 25 for retaining the mask M, for detecting a position of the mask M with respect to the mask retaining frame 25 when an exposure pattern is transferred onto the substrate W, through each step. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
