| 摘要 |
PROBLEM TO BE SOLVED: To provide a branch switch for high frequency power for a plasma generation apparatus capable of processing of a device weak to a change in current and voltage in plasma, and to provide an etching apparatus equipped with the branch switch. SOLUTION: The plasma generation apparatus has a structure where high frequency electric power is branched by a main electronic discharge generation electric power circuit to introduce a part of main electric discharge power to a sub electrode and the like. In the apparatus, a variable capacitor is employed as the branch device, and concerning the capacitance of the variable capacitor there is provided a capacitance value control device as a mechanism to switch a minimum capacitance value and a set capacitance value or a lower set capacitance value and a higher set capacitance value in a short time to the utmost with a pulse motor or a servo motor. COPYRIGHT: (C)2006,JPO&NCIPI
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