发明名称 VACUUM FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum film-forming apparatus having a thermometry means for precisely estimating the heat transferred onto a substrate from a heated vapor-deposition material through radiation, in a state of rotating the substrate, arranged in a proper position in a vacuum chamber. SOLUTION: This vacuum film-forming apparatus 100 comprises: the vacuum chamber; a substrate holder 4 placed in the vacuum chamber 1 so as to hold and rotate the substrate 3; an evaporation source 2 which is placed in the vacuum chamber 1 so as to face the substrate holder 4, and emits vapor-deposition particles toward the substrate 3 through heating a vapor-deposition material; and the thermometry means 10 for receiving and detecting heat rays radiated from the vapor-deposition material. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006097069(A) 申请公布日期 2006.04.13
申请号 JP20040283278 申请日期 2004.09.29
申请人 SHIN MEIWA IND CO LTD 发明人 OKADA MOTOI;MITANI SHIGENORI
分类号 C23C14/54 主分类号 C23C14/54
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