发明名称 METHOD FOR PRODUCING GALLIUM NITRIDE CRYSTAL BODY AND METHOD FOR PRODUCING GALLIUM NITRIDE SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a gallium nitride crystal body and a method for producing a gallium nitride substrate by efficiently removing a nitride deposition formed on the side of a gallium nitride crystal body for producing a gallium nitride substrate and the side of a substrate. SOLUTION: In the method for producing the gallium nitride substrate from a gallium nitride crystal body 24 grown on a substrate 9 composed of a material different from gallium nitride by a vapor deposition process, a nitride deposition 26 is formed on the side of the gallium nitride crystal body 24 and the side of the substrate 9 by growth. The method includes: a stage where the nitride deposition 26 is removed by outer circumferential working; a stage where, after the outer circumferential working, the substrate 9 is removed by etching; and a stage where, after the etching, the residual nitride deposition 26e is removed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006097058(A) 申请公布日期 2006.04.13
申请号 JP20040282447 申请日期 2004.09.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NAKAYAMA MASAHIRO
分类号 C23C16/01;C30B29/38;C30B33/00 主分类号 C23C16/01
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