发明名称 Semiconductive substrate cleaning systems
摘要 In one aspect, the invention includes a method of treating a surface of a substrate. A mixture which comprises at least a frozen first material and liquid second material is provided on the surface and moved relative to the substrate. In another aspect, the invention encompasses a method of treating a plurality of substrates. A treating member is provided proximate a first substrate, and an initial layer of frozen material is formed over a surface of the treating member. A surface of the first substrate is treated by moving at least one of the treating member and the first substrate relative to the other of the treating member and the first substrate. After the surface of the first substrate is treated, the initial layer of frozen material is removed from over the surface of the treating member. The treating member is then provided proximate another substrate, and the surface of the other substrate is treated by moving at least one of the treating member and the second substrate relative to the other of the treating member and the second substrate.
申请公布号 US2006076040(A1) 申请公布日期 2006.04.13
申请号 US20050290339 申请日期 2005.11.30
申请人 MOORE SCOTT E;DOAN TRUNG T 发明人 MOORE SCOTT E.;DOAN TRUNG T.
分类号 B08B3/00;B08B3/04;B24B9/00;B24B37/04;H01L21/00 主分类号 B08B3/00
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