| 摘要 |
PROBLEM TO BE SOLVED: To provide a particle removal technique wherein in an immersion type substrate processing apparatus the working load of an operator is light and an apparatus operation rate is not lowered. SOLUTION: Air bubbles from a bubbler 30 are supplied to a processing solution in a processing tank 10. The air bubbles are removed in air bubble removal parts 61, 62 provided in the middle of the passage of a circulation system 40 for the processing solution. Particles in the processing tank 10 are circulated, entrained by a flow of the processing solution together with the air bubbles and are removed with the air bubbles in the air bubble removal parts 61, 62. In the air bubble removal parts 61, 62, the processing solution is turned to collect the air bubbles to the center of the turning and remove them, so that the particles can be removed without the use of any filter. It is therefore possible to reduce a working load such as a filter exchange work without lowering an apparatus operation rate. COPYRIGHT: (C)2006,JPO&NCIPI
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