发明名称 Solid-state imaging device and solid-state imaging device manufacturing method
摘要 An object of the present invention is to provide a solid-state imaging device which can improve color mixture from adjacent color filter layers, nonuniform tone of lines and sensitivity variations. A solid-state imaging device 1 includes: a semiconductor substrate 11 on which pixels are placed like a matrix; and each of the pixels having a photoelectric conversion element 13 and a color filter layer 21 which is formed on the photoelectric conversion element 13 . The solid-state imaging device 1 includes resin parts 20 which are formed at the boundaries of these photoelectric conversion devices 13 which are adjacent to each other, each of the resin parts 20 having an upward convex shape. Each color filter layer 21 of the device is formed so that the color filter layer covers the area ranging from the summit of a resin part to the summit of an adjacent resin part, and each color filter layer 21 is thinner in the peripheral part than in the center part around the summit.
申请公布号 US2006077268(A1) 申请公布日期 2006.04.13
申请号 US20050243979 申请日期 2005.10.06
申请人 YOKOZAWA KENJI 发明人 YOKOZAWA KENJI
分类号 H04N5/335;H01L27/14;H04N9/04 主分类号 H04N5/335
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