发明名称 |
THIN FILM SEMICONDUCTOR DEVICE, PHOTOELECTRIC DEVICE, ELECTRONIC INSTRUMENT, METHOD OF MANUFACTURING THIN FILM SEMICONDUCTOR DEVICE AND THIN FILM ELECTRONIC DEVICE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To raise voltage withstand property and reduce off leakage current, in a thin film semiconductor device such as TFT (Thin Film Transistor) or the like, for example. <P>SOLUTION: A semiconductor film comprises a channel region and a source region as well as a drain region, into both of which impurity is doped and which are provided with an island-type plane pattern, and a gate electrode arranged so as to be opposed to the channel region through a gate insulating film. The concentration of the impurity in a first part neighbored to at least the channel region among the peripheral regions of the island-type plane patterns in respective source region and drain region is lower compared with a central region excluding a second part, excluding the peripheral region and neighbored to the channel region along the channel region. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006100506(A) |
申请公布日期 |
2006.04.13 |
申请号 |
JP20040283641 |
申请日期 |
2004.09.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
TAKENAKA SATOSHI;EGUCHI TSUKASA |
分类号 |
H01L29/786;G02F1/1362;G02F1/1368;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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