METHOD OF FORMING RECESS WITH LEVEL DIFFERENCE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a recess with a level difference in which a level difference part of desired shape can be formed in the recess. SOLUTION: The method of forming the recess with the level difference includes the steps of forming a first resist layer 12 so that the front surface of a substrate at the position of forming the recess 18 may be exposed to one surface side of the substrate 10, when the recess with the level difference having a level difference part 20 in which the level difference side of a lower surface than the surface of the substrate is formed in the recess 18 opened at the one surface side of the substrate 10; then forming a second resist layer 16 on the exposed surface of the substrate 10; etching the exposed surface of the substrate 10 which is exposed from the first resist layer 12 and the second resist layer 16; forming the first recess 15 of a predetermined depth; etching the entire surface including the level difference forming surface exposed by selectively removing the second resist layer 16 and the bottom of the first recess 15; forming the recess with the level difference; and then removing the first resist layer 12. COPYRIGHT: (C)2006,JPO&NCIPI