发明名称 |
Polishing composition and method of polishing with the same |
摘要 |
A polishing composition comprises: at least one compound selected from tetrazole compounds and derivatives thereof and anthranilic acid compounds and derivatives thereof; abrasive particles comprising associative abrasive particles; and an oxidizing agent.
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申请公布号 |
US2006075688(A1) |
申请公布日期 |
2006.04.13 |
申请号 |
US20050237974 |
申请日期 |
2005.09.29 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TAKENOUCHI KENJI |
分类号 |
C09K3/14;B24B37/00;C09K13/00;H01L21/304;H01L21/461 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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