发明名称 Polishing composition and method of polishing with the same
摘要 A polishing composition comprises: at least one compound selected from tetrazole compounds and derivatives thereof and anthranilic acid compounds and derivatives thereof; abrasive particles comprising associative abrasive particles; and an oxidizing agent.
申请公布号 US2006075688(A1) 申请公布日期 2006.04.13
申请号 US20050237974 申请日期 2005.09.29
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TAKENOUCHI KENJI
分类号 C09K3/14;B24B37/00;C09K13/00;H01L21/304;H01L21/461 主分类号 C09K3/14
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