A MASK AND A METHOD FOR TREATING A SUBSTRATE WITH A MATERIAL FLUX TO DEPOSIT OR REMOVE A LAYER HAVING A PREDETERMINED THICKNESS PROFILE

摘要

A mask is providing for treating a substrate with a material flux to deposit or remove a layer having a predetermined thickness profile. The mask comprises a plurality of apertures (45) for interfering upon oscillatory movement with the first beam of flux material in a manner such that a plurality of secondary beams of the material flux are generated which are directed to the surface of the substrate. The apertures (45) are arranged in a plurality of rows and positioned so that portions of apertures of one row are interspaced with portions of apertures of an adjacent row. The interspaced aperture portions have an average width that is smaller than an average width of aperture portions that are not interspaced.