发明名称 METHOD OF FABRICATING INTERFEROMETRIC MODULATORS BY SELECTIVELY REMOVING MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method of fabricating interferometric modulators by selectively removing material. SOLUTION: The method for making MEMS devices such as interferometric modulators involves selectively removing a sacrificial portion of a material to form an internal cavity, leaving behind a remaining portion of the material to form a post structure. The material may be blanket deposited and selectively changed to define sacrificial portions that are selectively removable relative to the remaining portions. Alternatively, a material layer can be laterally recessed away from openings in a covering layer. These methods may be used to make unreleased and released interferometric modulators. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006099112(A) 申请公布日期 2006.04.13
申请号 JP20050275059 申请日期 2005.09.22
申请人 IDC LLC 发明人 TUNG MING-HAU;FLOYD PHILIP D;ARBUCKLE BRIAN W
分类号 G02B26/08;B81C1/00 主分类号 G02B26/08
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