| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in PEB temperature dependence, line edge roughness, exposure latitude and pattern profile, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The positive resist composition contains: (A) a resin having an organic group of a specified structure and having the solubility to an alkali developer solution increased by the effect of an acid; (B) a compound generating a fluorine-substituted alkane sulfonic acid having 2 or 3 carbon atoms upon irradiation with active rays or radiation; and (C) a solvent. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
