发明名称 |
SCANNING PROJECTION ALIGNER, AND METHOD OF MANUFACTURING MICRO DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning projection aligner in which the deviation in projecting position is accurately corrected. <P>SOLUTION: The scanning projection aligner transfers a mask pattern onto a photosensitive substrate to be exposed by making a synchronous movement of a mask stage and a substrate stage relative to a projection optical system PL containing first projection optical units and second projection optical units which are arranged zigzag. The scanning projection aligner includes: a reference mark for measuring the arrangements of the first and second projection optical units arranged on the substrate stage PST; and an arrangement adjusting means which adjusts the arrangement of the second projection optical units with the information on the arrangement of the first projection optical units as a target value, based on the information on the arrangement of the first projection optical units which is based on the measurement results of the relative positions of a reference mark using the first projection optical units and first mask marks arranged in a direction perpendicular to the scanning direction on the mask, and the measurement results of the relative positions of a reference mark using the second projection optical units and the first mask marks. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2006100568(A) |
申请公布日期 |
2006.04.13 |
申请号 |
JP20040284921 |
申请日期 |
2004.09.29 |
申请人 |
NIKON CORP |
发明人 |
KATO MASANORI;SHIMIZU KENJI;WATANABE SATOYUKI;TOGUCHI MANABU |
分类号 |
H01L21/027;G03F7/20;G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|