发明名称 PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT STRUCTURE, METHOD OF MANUFACTURING PIEZOELECTRIC/ELECTROSTRICTIVE ELEMENT STRUCTURE, AND METHOD OF MANUFACTURING LIQUID JET HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide an element which allows microfabrication generally used in a semiconductor process and area enlargement and is excellent in durability and ferroelectric properties, and a manufacturing method thereof; a piezoelectric element structure which is excellent in durability and piezoelectric property that is one of the ferroelectric properties; and a liquid jet head which has a long, high-density liquid jet nozzle and is stable and highly reliable, and a manufacturing method thereof. <P>SOLUTION: A piezoelectric/electrostrictive element structure comprises a buffer layer which is formed by being oriented-grown on a monocrystal substrate; a lower electrode layer which is formed by being oriented-grown on the buffer layer; a piezoelectric/electrostrictive layer which is formed by being oriented-grown on the lower electrode layer; and an upper electrode layer which is formed on the piezoelectric/electrostrictive layer. The buffer layer is patterned, and the piezoelectric/electrostrictive layer is patterned according to the pattern of the buffer layer. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100814(A) 申请公布日期 2006.04.13
申请号 JP20050252375 申请日期 2005.08.31
申请人 CANON INC 发明人 TAKEDA KENICHI;FUKUI TETSURO
分类号 B41J2/045;B41J2/055;B41J2/135;B41J2/14;B41J2/145;B41J2/16;H01L41/08;H01L41/09;H01L41/18;H01L41/22;H01L41/29;H01L41/319;H02N2/00 主分类号 B41J2/045
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