| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition apparatus capable of improving the physical property value for a film deposited by the AD (aerosol deposition) method. <P>SOLUTION: The film deposition apparatus includes a chamber 1 having a substrate stage 9 to hold a substrate 8 with a film deposited thereon, an aerosol generation chamber 3 which includes a container to store raw powder to generate aerosol containing the raw powder by introducing carrier gas into the container, a superconducting coil 5 to align the crystal orientation in the raw powder contained in aerosol by applying the magnetic field to the flow passage of the aerosol generated in the aerosol generation chamber, and an injection nozzle 7 to deposit the raw powder with its crystal orientation aligned, on the substrate by spraying aerosol with the magnetic field applied thereto by the super-conducting coil, on the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
