发明名称 SUBSTRATE TREATMENT DEVICE AND MANUFACTURING APPARATUS FOR DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment device and a manufacturing apparatus for a display device capable of improving working efficiency by increasing the number of products to be treated per hour. SOLUTION: The manufacturing apparatus 30 includes a reversing chamber 32, a getter chamber 34, an adherent adsorbing chamber 36 and a sealing chamber 38 as treatment chambers for performing specific treatment, and comprises a moving mechanism 42 that moves among the chambers 32, 34, 36, 38 one by one, and a returning mechanism 3 for returning an electrostatic chuck discharged from the sealing chamber 38 to the reversing chamber 32. The apparatus 30 further comprises a vacuum pump PP for evacuating the chambers 32, 34, 36, 38 independently of each other, and shutters 33, 35, 37 for selectively partitioning the chambers. As a result, a plurality of electrostatic chucks circulate among the chambers 32, 34, 36, 38 to allow a plurality of front substrates 10 and back substrates 12 to receive different treatments at the same time in the apparatus 30. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006100136(A) 申请公布日期 2006.04.13
申请号 JP20040285320 申请日期 2004.09.29
申请人 TOSHIBA CORP 发明人 FURUYA MASAAKI;TAKEZAWA YOJI;KOBAYASHI HIROAKI
分类号 H01J9/26 主分类号 H01J9/26
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