发明名称 3D interconnect with protruding contacts
摘要 This invention relates to a semiconductor having protruding contacts comprising, a first semiconductor substrate having at least one interconnect located substantially within the first substrate, and a second semiconductor substrate having at least one protruding contact point that substantially contacts at least one interconnect.
申请公布号 US2006076664(A1) 申请公布日期 2006.04.13
申请号 US20040960827 申请日期 2004.10.07
申请人 CHEN CHIEN-HUA;CHEN ZHIZHANG;MEYER NEAL W 发明人 CHEN CHIEN-HUA;CHEN ZHIZHANG;MEYER NEAL W.
分类号 H01L23/02;H01L23/52 主分类号 H01L23/02
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