发明名称 |
DEVICE FOR FEEDING GAS TO CHAMBER AND METHOD FOR CONTROLLING CHAMBER INNER PRESSURE USING THE DEVICE |
摘要 |
<p>A device for feeding a gas to a chamber prevents flow rate control accuracy from greatly lowering in a small flow rate region, performs highly accurate flow rate control in the entire flow rate control region, and also controls a wide pressure range of a chamber by the highly accurate flow rate control. More particularly, the device for feeding a gas to a chamber is constituted of parallelly connected pressure-type flow rate control devices and a control device for controlling the operation of the flow rate control devices. The gas- feeding device feeds to the chamber a desired gas discharged by a vacuum pump while controlling the flow rate of the gas. One of the pressure-type flow rate control devices is a device controlling a gas flow rate range of up to 10% at a maximum of the maximum flow rate to be fed to the chamber, and the remaining flow rate control devices are devices controlling the remaining gas flow rate range.</p> |
申请公布号 |
KR20060031687(A) |
申请公布日期 |
2006.04.12 |
申请号 |
KR20067001108 |
申请日期 |
2006.01.17 |
申请人 |
FUJIKIN INC.;TOKYO ELECTRON LIMITED |
发明人 |
KANNAN HIROSHI;UNO TOMIO;DOHI RYOUSUKE;NISHINO KOUJI;NAKAMURA OSAMU;MATSUMOTO ATSUSHI;IKEDA NOBUKAZU |
分类号 |
G05D7/00;H01L21/02;G05D7/06 |
主分类号 |
G05D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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