| 摘要 |
To form a structure of optical layers (3) on a substrate (1), to give required optical effects, the layers are applied by sputtering. A protective layer (2) is applied to the rear surface of the substrate before the optical layers are sputtered on to the front surface. The protective layer has optical characteristics which match the sputtered layers using silicon oxide, silicon nitride, aluminum oxide and/or aluminum nitride in a thickness of 10-40 nm. |
